摘要
      为了提高BiVO4光催化剂的杀菌能力，构建了一种新的Z方案钒酸铋/2-乙基蒽醌（BiVO4/EAQ）光催化剂，用于在水环境中灭活抗生素抗性病原体和降解抗生素抗性基因（ARGs）。在BiVO4中引入EAQ通过促进电荷产生和抑制电子-空穴对复合来增强光催化性能。基于电子顺磁共振（EPR）和荧光探针定量分析的结果，60%-BiVO4/EAQ被证实是一种Z型异质结光催化剂。60%-BiVO4/EAQ复合物对福氏志贺菌HL表现出最高的灭活效率，在150分钟内完全灭活。清除剂实验和自由基浓度定量分析表明，自由基dotO2−和h+在光催化灭活过程中起主要作用，其次是自由基dotOH。此外，细胞外tetA抗性基因在6小时的光催化反应后几乎完全降解。利用原子力显微镜（AFM）观察了光催化反应下环状DNA的断裂途径，这可能也是ARG分解的机制。此外，BiVO4/EAQ复合材料在实际水基质中表现出良好的光催化失活性能。这项工作提供了一种有效的生物危害灭活方法。
Abstract
To improve the bactericidal capability of the BiVO4 photocatalyst, a novel Z-scheme bismuth vanadate/2-ethylanthraquinone (BiVO4/EAQ) photocatalyst was constructed to inactivate antibiotic-resistant pathogens and degrade antibiotic-resistance genes (ARGs) in aqueous environments. The introduction of EAQ into BiVO4 enhanced the photocatalytic performance by promoting charge generation and inhibiting electron-hole pair recombination. Based on the results of electron paramagnetic resonance (EPR) and fluorescent probe quantitative analyses, 60 %-BiVO4/EAQ was confirmed to be a Z-scheme heterojunction photocatalyst. The 60 %-BiVO4/EAQ composite exhibited the highest inactivation efficiency toward Shigella flexneri HL, with complete inactivation within 150 min. Scavenger experiments and radical concentration quantification assays indicated that radical dotO2− and h+ performed the major roles during photocatalytic inactivation, followed by radical dotOH. Moreover, the extracellular tetA resistance gene was almost completely degraded after a 6-hour photocatalysis reaction. The fragmentation pathway of circular DNA under photocatalysis reaction was observed with the aid of atomic force microscopy (AFM), which might also be the mechanism of ARG decomposition. Furthermore, BiVO4/EAQ composite performed good photocatalytic inactivation performance in actual water matrices. This work provides an efficient biohazard inactivation method.

https://www.sciencedirect.com/science/article/abs/pii/S1385894722052263